About NIO-LITH
Founded in December 2024, Nio-Lith SAS is a spin-off from 3D-Oxides.
The purpose of the company is to mass produce Lithium Niobate thin films (LiNbO3 or TFLN) on different substrates including sapphire and silicon substrates with various orientations (on Z-cut (C-plane) and C-cut (A-plane) sapphire).
An improved version of “Sybilla” equipment will be used for production of coated substrates to target a production of 15’000 wafers/year (4’’ inches) with possibility to address up to 30 wafers per batch (or up to 3x300 mm wafers per batch).
We foster your future devices with unmatched material properties towards new functionalities, miniaturization and integration capacities in the “More than Moore” vision addressing markets such as RF filters, Photonic Integrated Chips, Quantum systems or AI.
More to come…